Hacker Newsnew | past | comments | ask | show | jobs | submitlogin

For EUV, yeah. That shit's tricky.

The wiki page on EUV is uncharacteristically excellent.

https://en.wikipedia.org/wiki/Extreme_ultraviolet_lithograph...




> Since the optics already absorbs 96% of the EUV light, [...]

WTF!? Why? Is there any hope for better optics?


Mirrors on EUV machines are already the type that exceeds reflectivity of all mirrors ever produced.

That's why you have to build fabs around a multi-megawatt laser source.

The only known hope going forward are photonic crystal mirrors


But, why does 96% of the energy gets absorbed?


Each mirror absorbs about 30% of the EUV incident upon it (and the mask counts as a mirror). With about 9 total mirrors on the path, you're down to 0.7^9 ~= 4% of the initial light left.


Because everything absorbs EUV light. Every element out there has has bandgap wide enough for EUV




Consider applying for YC's Fall 2025 batch! Applications are open till Aug 4

Guidelines | FAQ | Lists | API | Security | Legal | Apply to YC | Contact

Search: